XPS instrument measures the energy of photoelectrons, produced when the surface of material is irradiated by monochromatic X-rays. In addition to elemental analysis of the surface of material, the small differences in the binding energy of emitted electrons, can also provide some chemical bonding information.
a) X-ray source with monochromator (FOCUS 500):
- dual anode (Al/Ag) X-ray source – Al Kα (1486.74 eV) or Ag Lα (2984.3 eV)
- monochromator - single crystal Quartz
- focusing and non-focusing mode of operation
b) precise XYZ manipulator samples holder with controlled heating and cooling
c) hemispherical electron energy analyser (PHOIBOS 100 MCD-5):
- 5 channel detector
- mean radius of 100 mm
- resolution of 0.85 eV (non-focusing mode) or 0.6 eV (focusing mode)
d) electron gun (FG 500) – used for the neutralization of the surface charging effects
d) ion gun for low-energy ions of inert and reactive gases (IQE 11/35) – energy range of 0.3 – 5 keV, produces ion beams with wide diameters, primarily used for ion implantation and sputtering
e) ion gun for low-energy ions with differential pumping (IQE 12/38) - energy range of 0.3 – 5 keV, spot size of ion-beam:160 μm, ion beam scanning range in X-Y direction: ±5 mm, primarily used for precise etching and sputtering
f) Residual Gas Analyser, RGA (Prisma Plus QMG 220)
SPECS XPS instrument-brochure